| Issue |
EPJ Web Conf.
Volume 335, 2025
EOS Annual Meeting (EOSAM 2025)
|
|
|---|---|---|
| Article Number | 12001 | |
| Number of page(s) | 2 | |
| Section | Focused Sessions - Optics with Complex Wavefronts | |
| DOI | https://doi.org/10.1051/epjconf/202533512001 | |
| Published online | 22 September 2025 | |
https://doi.org/10.1051/epjconf/202533512001
Invited - Multiplexed Hartmann Wavefront Sensors for Complex, Broadband, and Vector Wavefields
1 Saints-Pères Paris Institute for the Neurosciences, CNRS UMR 8003, Université Paris Cité, 45 rue des Saints-Pères, Paris 75006, France
2 Institut Langevin, ESPCI Paris, Université PSL, CNRS, Paris 75005, France
* Corresponding author: This email address is being protected from spambots. You need JavaScript enabled to view it.
Published online: 22 September 2025
Abstract
Optical sensors are limited to measuring intensity. For this reason, wavefront sensors need to convert phase information into intensity modulations. One method to achieve this involves using a Hartmann mask positioned near a camera sensor. This technique is compatible with low- coherence illumination and has been implemented using various encoding optical elements, such as arrays of holes or microlens arrays. For instance, high-resolution and quantitative phase imaging has been demonstrated using a diffraction grating [1], a method known as lateral shearing interferometry (LSI) [2].
In this presentation, we will illustrate how LSI can also measure broadband speckle wavefields generated through multiple scattering media [3], enabling digital fluorescence phase conjugation through tissues [4]. Additionally, we will present a generalization of LSI using a birefringent diffraction grating to perform polarimetric LSI of vector beams [5], which is relevant for optical metrology and polarization-resolved fluorescence microscopy. Finally, we will demonstrate that this generalized principle can be applied to single-shot hyperspectral wavefront sensing, leveraging the spectral dispersion of thin scattering media, with applications in the metrology of ultrashort lasers [6].
© The Authors, published by EDP Sciences, 2025
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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