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Cited article:

Influence of the beam profile and spectral bandwidth on interference lithography system based on table-top HHG EUV source

MingJie Yao, Xia Yu, Hao Li, Youyang Zhou, Rui Zhang, Kui Li and Xiaoshi Zhang
Optics & Laser Technology 202 115449 (2026)
https://doi.org/10.1016/j.optlastec.2026.115449