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Cited article:

Simultaneous atmospheric pressure plasma jet etching and laser irradiation for ultra-precise optical glass processing

Robert Heinke, Thomas Arnold, Martin Ehrhardt, Pierre Lorenz, Klaus Zimmer

EPJ Web Conf., 309 (2024) 03022

Published online: 2024-10-31

DOI: https://doi.org/10.1051/epjconf/202430903022

This article has been cited by the following article(s):

Stability of masking materials for pattern transfer of lithographic masks into fused silica by atmospheric pressure plasma jet etching

Robert Heinke, Lukáš Šilhan, Martin Ehrhardt, Pierre Lorenz, Joachim Zajadacz, Jens Bauer, Thomas Arnold, Mojmír Šerý and Klaus Zimmer
Micro and Nano Engineering 28 100309 (2025)
https://doi.org/10.1016/j.mne.2025.100309