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Optimization of reactive-ion etching (RIE) parameters for fabrication of tantalum pentoxide (Ta₂O₅) waveguide using Taguchi method

M. Firdaus A. Muttalib, Ruiqi Y. Chen, S. J. Pearce and Martin D. B. Charlton

EPJ Web Conf., 162 (2017) 01003

DOI: https://doi.org/10.1051/epjconf/201716201003

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