Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin filmsManuel Bärtschi, Daniel Schachtler, Silvia Schwyn-Thöny, Thomas Südmeyer and Roelene BothaEPJ Web Conf., 255 (2021) 03005DOI: https://doi.org/10.1051/epjconf/202125503005