| Issue |
EPJ Web Conf.
Volume 255, 2021
EOS Annual Meeting (EOSAM 2021)
|
|
|---|---|---|
| Article Number | 03004 | |
| Number of page(s) | 5 | |
| Section | Topical Meeting (TOM) 3- Optical System Design, Tolerancing and Manufacturing | |
| DOI | https://doi.org/10.1051/epjconf/202125503004 | |
| Published online | 18 November 2021 | |
https://doi.org/10.1051/epjconf/202125503004
Impact of Pupil Aberrations on Wavefront Manipulation
Carl Zeiss AG, Corporate Research and Technology, Jena location, Carl-Zeiss-Promenade 10, 07745 Jena, Germany
* Corresponding author: thomas.nobis@zeiss.com
Published online: 18 November 2021
A systematic and quantitative analysis is given of the impact of pupil aberrations on the imaging performance in wavefront manipulation applications using adaptive optical elements. For the practical case of rotationally-symmetric types of wavefront corrections, such as defocus or spherical aberration, analytical expressions of the induced aberrations are derived including their pupil and field dependence. Each aberration is thereby related to the specific pupil aberration present at the adaptive element. The results can be used to specify the acceptable amount of pupil correction required for a specific magnitude and type of wavefront manipulation.
© The Authors, published by EDP Sciences, 2021
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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