| Issue |
EPJ Web Conf.
Volume 255, 2021
EOS Annual Meeting (EOSAM 2021)
|
|
|---|---|---|
| Article Number | 03005 | |
| Number of page(s) | 4 | |
| Section | Topical Meeting (TOM) 3- Optical System Design, Tolerancing and Manufacturing | |
| DOI | https://doi.org/10.1051/epjconf/202125503005 | |
| Published online | 18 November 2021 | |
https://doi.org/10.1051/epjconf/202125503005
Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
1 RhySearch, the Research and Innovation Center in the Alpine Rhine Valley, Werdenbergstrasse 4, 9471 Buchs SG, Switzerland
2 Evatec Ltd.,, Hauptstrasse 1a, 9477 Trübbach, Switzerland
3 Laboratoire Temps-Fréquence, Université de Neuchâtel, 2000 Neuchâtel, Switzerland
* Corresponding author: manuel.baertschi@rhysearch.ch
Published online: 18 November 2021
To enable the production of sophisticated optical interference coating designs, coatings with very low absorption and stray light losses and excellent layer thickness deposition accuracy are required. The selection and optimization of suitable coating materials and deposition processes are consequently essential. This study investigated the influence of the plasma source power on the optical properties, layer uniformity and stress, scattered light behavior and optical losses of magnetron sputtered Ta2O5 thin films.
© The Authors, published by EDP Sciences, 2021
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