EPJ Web of Conferences
Volume 48, 2013OAM 2012 – Optics and Measurement International Conference
|Number of page(s)||5|
|Published online||03 May 2013|
Fabrication of diffractive elements using matrix laser lithography
Czech Technical University in Prague,
Faculty of Nuclear Sciences and Physical Engineering, Department of Physical
7, 115 19
Prague 1, Czech
a e-mail: email@example.com
In this paper, a laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.
© Owned by the authors, published by EDP Sciences, 2013
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