Issue |
EPJ Web of Conferences
Volume 52, 2013
ISVHECRI 2012 – XVII International Symposium on Very High Energy Cosmic Ray Interactions
|
|
---|---|---|
Article Number | 03004 | |
Number of page(s) | 5 | |
Section | EAS Physics | |
DOI | https://doi.org/10.1051/epjconf/20135203004 | |
Published online | 10 June 2013 |
https://doi.org/10.1051/epjconf/20135203004
The interplay between the electromagnetic and the muonic longitudinal profile at production
1 LIP, Av. Elias Garcia, 14–1, 1000-149 Lisboa, Portugal
2 Departamento de Física, IST, Av. Rovisco Pais, 1049-001 Lisboa, Portugal
a e-mail: ruben@lip.pt
The electromagnetic and the muonic longitudinal profile at production enclosure important information about the primary particle and the hadronic interactions that rule the shower development. In fact, these two profiles provide two different insights of the shower: the electromagnetic component gives a measurement of the energy and the strength of the neutral pion channel; while the muonic profile, being intimately related with the charged mesons decays, can be used as a direct probe for the high energy hadronic interactions.
In this work we explore the interplay between the electromagnetic and muonic profiles, by analysing their phenomenologic behaviour for different primary masses and energies, zenith angles, and also different high energy hadronic interaction models. We have found that the muonic longitudinal profile at production displays universal features similar to what is known for the electromagnetic one. Moreover, we show that both profiles have new primary mass composition variables which are fairly independent of the high energy hadronic interaction model.
Finally we discuss how the information in the electromagnetic and the muonic longitudinal profile can be combined to break the degeneracy between the primary masscomposition and the high energy hadronic physics.
© Owned by the authors, published by EDP Sciences, 2013
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 2.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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