| Issue |
EPJ Web Conf.
Volume 215, 2019
EOS Optical Technologies
|
|
|---|---|---|
| Article Number | 03004 | |
| Number of page(s) | 2 | |
| Section | Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 3 | |
| DOI | https://doi.org/10.1051/epjconf/201921503004 | |
| Published online | 10 September 2019 | |
https://doi.org/10.1051/epjconf/201921503004
Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm
Leibniz Institute of Surface Engineering (IOM), D-04318 Leipzig, Germany
* Corresponding author: frank.frost@iom-leipzig.de
Published online: 10 September 2019
A new approach for the realization of depth reference samples is presented. By a combination of photolithography, reactive ion beam etching, surface planarization with photoresists and a subsequent coating with non-transparent materials, defined sinusoidal surface profiles are generated which can be used as depth references for the comparison and calibration of different surface profile measurements. The smallest realized surface amplitudes are in the range of less than 0.1 nm.
© The Authors, published by EDP Sciences, 2019
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