| Issue |
EPJ Web Conf.
Volume 238, 2020
EOS Annual Meeting (EOSAM 2020)
|
|
|---|---|---|
| Article Number | 02004 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 2- Computational, Adaptive and Freeform Optics | |
| DOI | https://doi.org/10.1051/epjconf/202023802004 | |
| Published online | 20 August 2020 | |
https://doi.org/10.1051/epjconf/202023802004
Phase-shift mask fabrication at micrometric scale by ion-exchange in glass for astronomical wavefront sensors
1 Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n, E-15782, Santiago de Compostela, Galicia, Spain.
2 Department of Applied Physics, University of Cantabria, 39005 Santander, Spain.
∗ e-mail: xesus.prieto.blanco@usc.es
Published online: 20 August 2020
Photolithography combined with ion-exchange in glass is a well-known technology that can be applied to develop many different optical devices. In this work, we present the complete procedure to generate small circular phase-shift masks with diameters of only a few microns and high control in the phase change produced. It is a strategic element in applications such as optical astronomy.
© The Authors, published by EDP Sciences, 2020
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