EPJ Web Conf.
Volume 238, 2020EOS Annual Meeting (EOSAM 2020)
|Number of page(s)||2|
|Section||Topical Meeting (TOM) 2- Computational, Adaptive and Freeform Optics|
|Published online||20 August 2020|
Phase-shift mask fabrication at micrometric scale by ion-exchange in glass for astronomical wavefront sensors
1 Quantum Materials and Photonics Group, Department of Applied Physics, Faculty of Physics / Faculty of Optics and Optometry, University of Santiago de Compostela, Campus Vida s/n, E-15782, Santiago de Compostela, Galicia, Spain.
2 Department of Applied Physics, University of Cantabria, 39005 Santander, Spain.
∗ e-mail: email@example.com
Published online: 20 August 2020
Photolithography combined with ion-exchange in glass is a well-known technology that can be applied to develop many different optical devices. In this work, we present the complete procedure to generate small circular phase-shift masks with diameters of only a few microns and high control in the phase change produced. It is a strategic element in applications such as optical astronomy.
© The Authors, published by EDP Sciences, 2020
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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