EPJ Web Conf.
Volume 238, 2020EOS Annual Meeting (EOSAM 2020)
|Number of page(s)||2|
|Section||Topical Meeting (TOM) 3- Optical System Design, Tolerancing and Manufacturing|
|Published online||20 August 2020|
Octopus – Application test of a simple and effective tool for polishing slurry monitoring
1 EUniversity of Applied Sciences, 94469, Deggendorf, Germany
2 EFisba AG, 9016 ST. Gallen, Switzerland
* Corresponding author: Christian.firstname.lastname@example.org
Published online: 20 August 2020
In the digital age it has become a fundamental issue to monitor and control process parameters continuously and automatically. The monitoring of critical process parameters enables better quality at lower production costs and higher yields. In order to investigate the interactions between production quality and polishing parameters, we have developed a solution for automatic and reliable measurement of critical parameters. With this paper we first document the resolution and accuracy of the system compared to manual measuring methods currently in use.
© The Authors, published by EDP Sciences, 2020
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.