| Issue |
EPJ Web Conf.
Volume 238, 2020
EOS Annual Meeting (EOSAM 2020)
|
|
|---|---|---|
| Article Number | 05006 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 5- Resonant Nanophotonics: Fundamentals and Applications | |
| DOI | https://doi.org/10.1051/epjconf/202023805006 | |
| Published online | 20 August 2020 | |
https://doi.org/10.1051/epjconf/202023805006
Fabrication and characterization of plasmonic band-stop filter using Ag grating
Mie University, Graduate School of Engineering, 1577 Kurima-machiya-cho Tsu, Japan
* Corresponding author: motogaito@elec.mie-u.ac.jp
Published online: 20 August 2020
This study proposes a plasmonic band-stop filter with surface plasmon resonance in a doublelayer wire grid structure targeting short-wavelength visible and near-ultraviolet regions for applications in ultraviolet photography. Using Ag and Al, the rigorous coupling wave of analysis method revealed that the maximum absorption was approximately 90% at 450 nm and 375 nm. The experiments using Ag produced similar results in a simulation. These results demonstrate that plasmonic band-stop filters in the visible and near-UV region can be realized at 450 nm and 375 nm using Ag or Al.
© The Authors, published by EDP Sciences, 2020
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