| Issue |
EPJ Web Conf.
Volume 266, 2022
EOS Annual Meeting (EOSAM 2022)
|
|
|---|---|---|
| Article Number | 10015 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 10- Frontiers in Optical Metrology | |
| DOI | https://doi.org/10.1051/epjconf/202226610015 | |
| Published online | 13 October 2022 | |
https://doi.org/10.1051/epjconf/202226610015
Coherent Fourier Scatterometry for defect detection on SiC samples
Optics Research Group, Imaging Physics Department, Faculty of Applied Sciences, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands
* Corresponding author: j.rafighdoost@tudelft.nl
Published online: 13 October 2022
Coherent Fourier Scatterometry (CFS) is a scatterometry technique that has been applied for grating and nanoparticle detection. Here, it has been challenged to verify the detectability of the so-called killer defects on SiC samples for power electronic applications. It has been shown that CFS is able to precisely recognize these defects regardless of their shape or size. CFS could be considered as a possible alternative for this purpose.
© The Authors, published by EDP Sciences
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