| Issue |
EPJ Web Conf.
Volume 285, 2023
30th Conference of the International Nuclear Target Development Society (INTDS2022)
|
|
|---|---|---|
| Article Number | 03001 | |
| Number of page(s) | 4 | |
| Section | Method Development | |
| DOI | https://doi.org/10.1051/epjconf/202328503001 | |
| Published online | 22 June 2023 | |
https://doi.org/10.1051/epjconf/202328503001
The process of molecular plating and the characteristics of the produced thin films – What we have learned in 60 years and what is still unknown
1 Johannes Gutenberg Universität Mainz, 55099 Mainz, Germany
2 Helmholtz-Institut Mainz, 55099 Mainz, Germany
3 GSI Helmholtzzentrum für Schwerionenforschung GmbH, 64291 Darmstadt, Germany
* Corresponding author: erartes@uni-mainz.de
Published online: 22 June 2023
Molecular plating is a well-established and widely used method for producing thin films of various elements, which are used in variety of nuclear physics applications. Sixty years have passed since the method was established, and some insights into the chemical process underlying the method and the composition of the thin films have been gained. A brief overview of what has been learned about molecular plating since its introduction and the methods applied in the characterization of molecular plated thin films is given here. Through various spectroscopic and microscopic methods, the process of molecular plating and the chemical composition are gradually being elucidated, albeit we still do not understand all aspects.
© The Authors, published by EDP Sciences, 2023
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