| Issue |
EPJ Web Conf.
Volume 335, 2025
EOS Annual Meeting (EOSAM 2025)
|
|
|---|---|---|
| Article Number | 03020 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting - Applications of Optics and Photonics | |
| DOI | https://doi.org/10.1051/epjconf/202533503020 | |
| Published online | 22 September 2025 | |
https://doi.org/10.1051/epjconf/202533503020
High Harmonic Generation driven Extreme Ultraviolet 0th order Scatterometry for Nanostructure Characterization
1 Advanced Research Center for Nanolithography, Science Park 106, 1098XG, Amsterdam, NL
2 Department of Physics and Astronomy & LaserLaB, Vrije Universiteit, De Boelelaan 110, 1081HV Amsterdam, NL
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Published online: 22 September 2025
Abstract
We introduce a tabletop high harmonic generation (HHG) scatterometry technique to extract structural and material characteristics of periodic nanostructures. Grazing incidence reflection scatterometry enables fast and robust measurements of linewidth and groove height with 20 nm and 2 nm precision respectively, paving the way for ultrafast spectroscopy on layered heterostructures.
© The Authors, published by EDP Sciences, 2025
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