Open Access
| Issue |
EPJ Web Conf.
Volume 335, 2025
EOS Annual Meeting (EOSAM 2025)
|
|
|---|---|---|
| Article Number | 01003 | |
| Number of page(s) | 2 | |
| Section | Face2Phase (F2P) | |
| DOI | https://doi.org/10.1051/epjconf/202533501003 | |
| Published online | 22 September 2025 | |
- Stephan Dottermusch, Dmitry Busko, Malte Langenhorst, Ulrich W. Paetzold, and Bryce S. Richards, Exposure-dependent refractive index of Nanoscribe IP-Dip photoresist layers. Optics Letters 44, 29-32 (2019). https://doi.org/10.1364/OL.44.000029 [Google Scholar]
- Timo Gissibl, Sebastian Wagner, Jachym Sykora, Michael Schmid, and Harald Giessen, Refractive index measurements of photo-resists for three-dimensional direct laser writing. Optical Materials Express 7, 2293-2298 (2017). https://doi.org/10.1364/OME.7.002293 [Google Scholar]
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