Open Access
| Issue |
EPJ Web Conf.
Volume 335, 2025
EOS Annual Meeting (EOSAM 2025)
|
|
|---|---|---|
| Article Number | 08011 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting - Optical Materials | |
| DOI | https://doi.org/10.1051/epjconf/202533508011 | |
| Published online | 22 September 2025 | |
- J. Liu, G. Huang, R.N. Wang, et al. High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits. Nat Commun 12, 2236 (2021). doi.org/10.1038/s41467-021-21973-z [Google Scholar]
- T. Handte, S. Bohm, A. Behrens, et al. Advanced manufacturing techniques for amorphous silicon carbide (a-SiC:H): optimized deposition and etching processes for microoptical element fabrication. Opt. Mater. Express 15, 74-94, 2025. doi.org/10.1364/OME.539439 [Google Scholar]
- S. Gündoğdu, S. Pazzagli, T. Pregnolato, et al. AlGaN/AlN heterostructures: an emerging platform for integrated photonics. npj Nanophoton. 2, 2 2025. doi.org/10.1038/s44310-024-00048-z [Google Scholar]
- P.N. Bernal, S. Florczak, S. Inacker et al. The road ahead in materials and technologies for volumetric 3D printing. Nat. Rev. Mater 2025. doi.org/10.1038/s41578-025-00785-3 [Google Scholar]
- X. Meng, C. Yuan, X. Cheng, et al. Thin-Film Lithium Niobate Modulators with Ultra-High Modulation Efficiency. Laser Photonics Rev. 19, 2024. doi.org/10.1002/lpor.202400809 [Google Scholar]
- R. Yanagimoto, B.A. Ash, M.M. Sohoni, et al. Programmable on-chip nonlinear photonics doi.org/10.48550/arXiv.2503.19861 [Google Scholar]
- S. Queste, E. Courjon, G. Ulliac, et al. Deep reactive ion etching of quartz, lithium nio-bate and lead titanate. JNTE Proc, 1 1-2, (2008). [Google Scholar]
- Y. Zhao, W. Duan, C. Wang, et al. LiNbO3 dynamic memristors for reservoir computing. Front. Neurosci. 17, 2023. doi:10.3389/fnins.2023.1177118 [Google Scholar]
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