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Cited article:

Residual stresses in AlCrN PVD thin films

T.H.T. Pham, E. Le Bourhis, P. Goudeau, P. Guérin

EPJ Web of Conferences, 6 (2010) 26002

Published online: 2010-06-10

DOI: https://doi.org/10.1051/epjconf/20100626002

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(2024)
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Residual Stress Analysis in High‐Speed Physical Vapor Deposition Coatings

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Advanced Engineering Materials 26 (24) (2024)
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Tribomechanical Behaviour of TiAlN and CrAlN Coatings Deposited onto AISI H11 with Different Pre-Treatments

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Time- and space-resolved high-throughput characterization of stresses during sputtering and thermal processing of Al–Cr–N thin films

D Grochla, A Siegel, S Hamann, et al.
Journal of Physics D: Applied Physics 46 (8) 084011 (2013)
https://doi.org/10.1088/0022-3727/46/8/084011