Residual stresses in AlCrN PVD thin films
EPJ Web of Conferences, 6 (2010) 26002
Published online: 2010-06-10
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Time- and space-resolved high-throughput characterization of stresses during sputtering and thermal processing of Al–Cr–N thin films
D Grochla, A Siegel, S Hamann, et al.Journal of Physics D: Applied Physics 46 (8) 084011 (2013)
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