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Cited article:

Deep-reactive ion etching of silicon nanowire arrays at cryogenic temperatures

Jiushuai Xu, Andam Deatama Refino, Alexandra Delvallée, Sebastian Seibert, Christian Schwalb, Poul Erik Hansen, Martin Foldyna, Lauryna Siaudinyte, Gerry Hamdana, Hutomo Suryo Wasisto, Jonathan Kottmeier, Andreas Dietzel, Thomas Weimann, Jan Kristen Prüssing, Hartmut Bracht and Erwin Peiner
Applied Physics Reviews 11 (2) (2024)
https://doi.org/10.1063/5.0166284