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Cited article:

Development and Performance Evolution of Medium-Pressure He/SF6/O2-Based Plasma and Wet Chemical Etching Process for Surface Modification of Fused Silica

Hari Narayan Singh Yadav and Manas Das
Plasma Chemistry and Plasma Processing 44 (2) 1083 (2024)
https://doi.org/10.1007/s11090-024-10447-x