| Issue |
EPJ Web Conf.
Volume 287, 2023
EOS Annual Meeting (EOSAM 2023)
|
|
|---|---|---|
| Article Number | 02005 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 2- Adaptive and Freeform Optics | |
| DOI | https://doi.org/10.1051/epjconf/202328702005 | |
| Published online | 18 October 2023 | |
https://doi.org/10.1051/epjconf/202328702005
Optical Design of a High Flux Setup in the Extreme Ultraviolet
1 Fraunhofer-Institute für Laser Technology ILT, Steinbach Str. 15, 52074, Aachen, Germany
2 Department of Electronics Engineering and Communications, South East Technological University, Carlow, Ireland.
* Corresponding author: haider.aljuboori@setu.ie
Published online: 18 October 2023
Extreme ultraviolet (XUV) light applications are still a very promising field that was heavily enlivened by the definition of the new wavelength for semiconductor lithography within the XUV range. But the detection of XUV light is also important for the exploration in the field of space science (i.e., monitoring the formation and evolution of solar storms) and high-energy physics (i.e., dark matter detection). The advancement of this technology mainly depends on the performance optimization of XUV sources, optical systems and related photodetectors. In this work, the optical design of a high flux XUV setup was simulated and defined to optimise the beam path which is the backbone of the initial evaluation process for the characterisation of luminescent materials under XUV irradiation. Additionally, the paper focused on the conceptualisation and realisation of the experimental setup as well as the alignment of the optical components and the detector calibration.
© The Authors, published by EDP Sciences, 2023
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