| Issue |
EPJ Web Conf.
Volume 215, 2019
EOS Optical Technologies
|
|
|---|---|---|
| Article Number | 06003 | |
| Number of page(s) | 2 | |
| Section | Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 6 | |
| DOI | https://doi.org/10.1051/epjconf/201921506003 | |
| Published online | 10 September 2019 | |
https://doi.org/10.1051/epjconf/201921506003
Testing and characterization of challenging optics and optical systems with Shack Hartmann wavefront sensors
Imagine Optic, 18 rue Charles de Gaulle 91400 Orsay, France
* Corresponding author: jsiv@imagine-optic.com
Published online: 10 September 2019
The Shack-Hartman wavefront sensor is a common metrology tool in the field of laser, adaptive optics and astronomy. However, this technique is still scarcely used in optics and optical system metrology. With the development of manufacturing techniques and the increasing need for optical characterization in the industry, the Shack-Hartmann wavefront sensor emerges as an efficient complementary tool to the well-established Fizeau interferometry for optical system metrology. Moreover, the raise of smart vehicles equipped with optical sensors and augmented reality, the optical characterization of glass and transparent flat materials becomes an issue that can be addressed with Shack-Hartmann sensors. Aberration measurements of challenging optics will be presented such as optical filters, thin flat optics, aspheric lenses and large optical assemblies.
© The Authors, published by EDP Sciences, 2019
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