EPJ Web Conf.
Volume 215, 2019EOS Optical Technologies
|Number of page(s)||2|
|Section||Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 6|
|Published online||10 September 2019|
Figuring of optical aluminium devices by reactive ion beam etching
Leibniz Institute of Surface Engineering (IOM), Permoserstrasse 15, D-04318 Leipzig, Germany
2 TU Dresden, Institute of Manufacturing Science and Engineering, George-Bähr-Strasse 3c, D-01062 Dresden, Germany
* e-mail: email@example.com
Published online: 10 September 2019
Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g. Al6061)fails, since the surface roughness increases drastically as a result of inhomogeneous etching due to structural, crystallographic and chemical irregularities inside the material matrix. As an alternative figuring technology reactive ion-beam etching (RIBE) is a promising route. RIBE provides the direct machining of Al alloys while preserving the surface roughness almostin its initial state. The RIBE process with nitrogengasis focused more detailedin this study.
© The Authors, published by EDP Sciences, 2019
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