EPJ Web Conf.
Volume 215, 2019EOS Optical Technologies
|Number of page(s)||2|
|Section||Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 6|
|Published online||10 September 2019|
Figuring of optical aluminium devices by reactive ion beam etching
Leibniz Institute of Surface Engineering (IOM), Permoserstrasse 15, D-04318 Leipzig, Germany
2 TU Dresden, Institute of Manufacturing Science and Engineering, George-Bähr-Strasse 3c, D-01062 Dresden, Germany
* e-mail: firstname.lastname@example.org
Published online: 10 September 2019
Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g. Al6061)fails, since the surface roughness increases drastically as a result of inhomogeneous etching due to structural, crystallographic and chemical irregularities inside the material matrix. As an alternative figuring technology reactive ion-beam etching (RIBE) is a promising route. RIBE provides the direct machining of Al alloys while preserving the surface roughness almostin its initial state. The RIBE process with nitrogengasis focused more detailedin this study.
© The Authors, published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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