| Issue |
EPJ Web Conf.
Volume 255, 2021
EOS Annual Meeting (EOSAM 2021)
|
|
|---|---|---|
| Article Number | 12014 | |
| Number of page(s) | 4 | |
| Section | Topical Meeting (TOM) 14- Advances and Applications of Optics and Photonics | |
| DOI | https://doi.org/10.1051/epjconf/202125512014 | |
| Published online | 18 November 2021 | |
https://doi.org/10.1051/epjconf/202125512014
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
1 Thales Research & Technology, 1 Av Fresnel, 91767 Palaiseau, France
2 Fraunhofer Institute for Applied Optics and Precision Engineering, Albert-Einstein-Strasse 7, 07745 Jena, Germany
3 Thales Alenia Space, 5 Allée des Gabians, BP 99, 06156 Cannes la Bocca Cedex, France
4 European Space Research and Technology Centre, Postbus 299-2200 AG Noordwijk, The Netherlands
* Corresponding author: mane-si-laure.lee@thalesgroup.com
Published online: 18 November 2021
We report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings on 3” wafers by two lithography technologies (e-beam or nanoimprint) followed by dry etching process. These subwavelength gratings enable broadband efficiency which is in average 15%-20% above the efficiency requirement for next generation of spectro-imagers for Earth observation missions and a wavefront error that is much smaller than the 100 nm requirement for space application.
© The Authors, published by EDP Sciences, 2021
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