Issue |
EPJ Web Conf.
Volume 287, 2023
EOS Annual Meeting (EOSAM 2023)
|
|
---|---|---|
Article Number | 04026 | |
Number of page(s) | 2 | |
Section | Topical Meeting (TOM) 4- Nanophotonics | |
DOI | https://doi.org/10.1051/epjconf/202328704026 | |
Published online | 18 October 2023 |
https://doi.org/10.1051/epjconf/202328704026
Patterning of SiO2 interfaces for radiative cooling applications
1 School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, PR China
2 European Laboratory for Non-linear Spectroscopy (LENS), University of Florence, Sesto Fiorentino, 50019, Italy
3 Center for Composite Materials and Structure, Harbin Institute of Technology, Harbin, 150001, PR China
4 Istituto Nazionale di Ricerca Metrologica (INRiM), Turin, 10135, Italy
* Corresponding author: l.pattelli@inrim.it
Published online: 18 October 2023
Silicon dioxide (SiO2) is a prominent material for radiative cooling applications due to its negligible absorption at solar wavelengths (0.25-2.5 µm) and exceptional stability. However, at thermal infrared wavelengths, its bulk phonon-polariton band introduces a strong reflection peak inside the atmospheric transparency window (8-13 µm) which is detrimental to its selective emissivity. Herein, we demonstrate scalable strategies for the patterning of ordered and disordered SiO2 metasurfaces enhancing their thermal emissivity and enabling sub-ambient passive cooling under direct sunlight.
© The Authors, published by EDP Sciences, 2023
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