| Issue |
EPJ Web Conf.
Volume 287, 2023
EOS Annual Meeting (EOSAM 2023)
|
|
|---|---|---|
| Article Number | 05026 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 5- Optical Materials | |
| DOI | https://doi.org/10.1051/epjconf/202328705026 | |
| Published online | 18 October 2023 | |
https://doi.org/10.1051/epjconf/202328705026
Stochastic antireflection structures on silicon fabricated by reactive ion etching
1 Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Germany
2 Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany
3 Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences, Munich, Germany
* Corresponding author: david.schmelz@uni-jena.de
Published online: 18 October 2023
Stochastic Si nanostructures for antireflection (AR) fabricated by reactive ion etching (RIE) are presented for use in different spectral ranges. The lithography-free fabrication enables its application on highly curved surfaces. ALD-coatings of Al2O3 of varying thickness can improve the mechanical stability of such structures while keeping their optical functionality. While typical black silicon structures are suitable for application from VIS to NIR, an RIE-based fabrication process for stochastic AR structures in the longer IR and THz range is presented as well.
© The Authors, published by EDP Sciences, 2023
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