| Issue |
EPJ Web Conf.
Volume 309, 2024
EOS Annual Meeting (EOSAM 2024)
|
|
|---|---|---|
| Article Number | 03005 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 3- Optical System Design, Tolerancing and Manufacturing | |
| DOI | https://doi.org/10.1051/epjconf/202430903005 | |
| Published online | 31 October 2024 | |
https://doi.org/10.1051/epjconf/202430903005
An integrated exposure and measurement tool for 5-DOF direct laser writing
Technische Universität Ilmenau, Dept. of Mech. Eng., Institute of Process Measurement and Sensor Technology, Ehrenbergstraße 29, 98693 Ilmenau, Germany
* e-mail: johannes.belkner@tu-ilmenau.de
Published online: 31 October 2024
Accurate and uniform fabrication of microstructures on highly curved substrates requires exposure with the waist of a focused laser beam at every point. In order to realize this, the exposure beam must be held perpendicular and focused onto the local substrate. Here we present an optical tool for our developed 5-axis nano-positioning and nano-measurement machine based on the chromatic differential confocal microscope.
© The Authors, published by EDP Sciences, 2024
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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