| Issue |
EPJ Web Conf.
Volume 309, 2024
EOS Annual Meeting (EOSAM 2024)
|
|
|---|---|---|
| Article Number | 03004 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting (TOM) 3- Optical System Design, Tolerancing and Manufacturing | |
| DOI | https://doi.org/10.1051/epjconf/202430903004 | |
| Published online | 31 October 2024 | |
https://doi.org/10.1051/epjconf/202430903004
Additive manufactured cerium oxide foils, used as pads for polishing processes of brittle-hard materials
1 Ernst-Abbe University of Applied Sciences Jena, Carl-Zeiss-Promenade 2, 07745 Jena, Germany
2 QSIL Ceramics GmbH (formerly SiCeram GmbH), Am Nasstal 10, 07751 Jena, Germany
3 Technische Universität Ilmenau, Ehrenbergstrasse 29, 98693 Ilmenau, Germany
* Corresponding author: Christian.Schulze@eah-jena.de
Published online: 31 October 2024
A new concept for polishing pads for flat and spherical surfaces is introduced which comprises additive manufactured polishing pads made of cerium oxide. By using additive manufacturing technologies, polishing processes with polishing slurry can be substituted with tools containing bonded grain. The bonded polishing pads can be fabricated using rolling processes. The pad geometries can be adjusted by using laser cutting. Furthermore, surface modifications of the pad can be applied with laser processes to favour quality and economic factors of the polishing procedure. First results from the experimental setup are showing, that lapped surfaces with a roughness Rq of ~ 500 nm can be improved to approx. Rq = 30 nm roughness by polishing with bonded grain cerium oxide foils. Further approaches for future investigations and applications are proposed.
© The Authors, published by EDP Sciences, 2024
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