| Issue |
EPJ Web Conf.
Volume 335, 2025
EOS Annual Meeting (EOSAM 2025)
|
|
|---|---|---|
| Article Number | 05015 | |
| Number of page(s) | 2 | |
| Section | Topical Meeting - Nanophotonics | |
| DOI | https://doi.org/10.1051/epjconf/202533505015 | |
| Published online | 22 September 2025 | |
https://doi.org/10.1051/epjconf/202533505015
Robust meta-surface designs for ultra-high reflectivity in precision interferometry
1 Friedrich-Schiller-University, Institute of Applied Physics, Albert-Einstein-Strasse 15, 07745 Jena, Germany
2 TU Braunschweig, Institute of Semiconductor Technology, Langer Kamp 6a, 38106 Braunschweig, Germany
3 Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany
4 Physikalisch-Technische Bundesanstalt, Metrology for Functional Nanosystems Working Group 4.01, Bundesallee 100, 38116 Braunschweig, Germany
* Corresponding author: This email address is being protected from spambots. You need JavaScript enabled to view it.
Published online: 22 September 2025
Abstract
Metasurfaces enable precise light manipulation, like fostering reflections close to unity, through resonance mechanisms. While traditional Bragg mirrors enable very high reflectivity they limit the achievable thermal noise. Meta-material-mirrors (MMM) can overcome the noise limitations but suffer from limited reflectivity. This trade-off is crucial for next-generation cryogenic gravitational wave detectors, such as the Einstein Telescope, which need high reflectivity and low thermal noise test mass coatings to achieve dramatic sensitivity. Hence, we are proposing a new combined design unifying the advantages from both approaches - composed of an MMM, a Fabry–Pérot spacer, and a Bragg mirror – achieving extremely high reflectance and low thermal noise. We are evaluating different 1D and 2D design approaches to achieve MMM robust to fabrication tolerances while offering broad, high reflection at 1550 nm. A key focus is on bandwidth, manufacturability, and thermal noise. This systematic analysis provides a pathway to promising MMM for production via e.g. character projection electron beam lithography, paving the way for high-performance mirrors in gravitational wave astronomy and beyond.
© The Authors, published by EDP Sciences, 2025
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.

