EPJ Web Conf.
Volume 215, 2019EOS Optical Technologies
|Number of page(s)||2|
|Section||Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 2|
|Published online||10 September 2019|
- Most, T. and J. Will (2011). Sensitivity analysis using the Metamodel of Optimal Prognosis, Proceedings Weimarer Optimization and Stochastic Days 8.0, Weimar, Germany [Google Scholar]
- Most, T. and J. Will (2012). Robust Design Optimization in industrial virtual product development, Proceedings 5th International Conference on Reliable Engineering Computing, Brno, 2012 [Google Scholar]
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