Open Access
Issue
EPJ Web Conf.
Volume 215, 2019
EOS Optical Technologies
Article Number 04002
Number of page(s) 2
Section Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 4
DOI https://doi.org/10.1051/epjconf/201921504002
Published online 10 September 2019
  1. R. Steinkopf, A. Gebhardt, S. Scheiding, M. Rohde, O. Stenzel, S. Gliech, V. Giggel, H. Löscher, G. Ullrich, P. Rucks, A. Duparre, S. Risse, R. Eberhardt, A. Tünnermann, Proc. SPIE 7102, Optical Fabrication, Testing, and Metrology III, 71020C (2008) [CrossRef] [Google Scholar]
  2. G. P. H. Gubbels, B. W. H. Venrooy, R. Henselmans, Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 742607 (2009) [CrossRef] [Google Scholar]
  3. M. Weiser, Nucl. Instruments Methods Phys. Res. Sect. B Beam Interact. With Mater. Atoms, 267, 1390-1393 (2009) [CrossRef] [Google Scholar]
  4. J. E. Harvey, A. Kotha, Proc. SPIE -The International Society for Optical Engineering 2576, 155-174 (1995) [Google Scholar]
  5. J. M. Bennett, Meas. Sci. Technol. 3, 1119-1127 (1992) [Google Scholar]
  6. J. Bauer, M. Ulitschka, F. Frost, T. Arnold, EOS Opt. Technol. / 5th Conf. Manuf. Opt. Syst., (European Optical Society, Munich / Germany 2017) [Google Scholar]
  7. J. Bauer, F. Frost, T. Arnold, J. Phys. D. Appl. Phys. 50, 85101 (2017) [Google Scholar]

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.