Open Access
Issue |
EPJ Web Conf.
Volume 215, 2019
EOS Optical Technologies
|
|
---|---|---|
Article Number | 07001 | |
Number of page(s) | 2 | |
Section | Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 7: Plenary Session | |
DOI | https://doi.org/10.1051/epjconf/201921507001 | |
Published online | 10 September 2019 |
- Bliedtner, Jens and Graefe, Günter Optiktechnologie (Carl Hanser Verlag, München, 2010) [Google Scholar]
- Zhong, Bo; Huang, Hongzhong; Chen, Xianhua; Deng, Wenhui and Wang, Jian Modelling and simulation of mid-spatial-frequency error generation in CCOS, (J. Eur. Opt. Soc.-Rapid Publ. (Journal of the European Optical Society-Rapid Publications), 2018) [Google Scholar]
- Schneider, Robert; Haberl, Alexander and Rascher, Rolf, Polishing tool and the resulting TIF for three variable machine parameters as input for the removal simulation, (Proc. of 4th European Seminar on Precision Optics Manufacturing, 2017) [Google Scholar]
- Killinger, Simon; Liebl, Johannes and Rascher, Rolf Mid-Spatial-Frequency-Errors in feed direction occurring in ADAPT Polishing, (Proc. of 6th European Seminar on Precision Optics Manufacturing, 2019) [Google Scholar]
- Pohl, Mario; Börret, Rainer; Rascher, Rolf and Kukso, Olga, Simulation of MSF errors using Fourier transform, (Proc. of 5th European Seminar on Precision Optics Manufacturing, 2018) [Google Scholar]
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