EPJ Web Conf.
Volume 215, 2019EOS Optical Technologies
|Number of page(s)||2|
|Section||Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 7: Plenary Session|
|Published online||10 September 2019|
Analysis of residual errors during computer controlled polishing
Deggendorf Institute of Technology, Dieter-Görlitz-Platz 1, 94469 Deggendorf
* e-mail: email@example.com
Published online: 10 September 2019
In computer controlled subapertur polishing the formation of mid spatial frequency errors (MSFE) needs special attention. In this work the formation of MSFE in feed direction is investigated using the ADAPT tool from Satisloh.
© The Authors, published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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