Open Access
Issue |
EPJ Web Conf.
Volume 309, 2024
EOS Annual Meeting (EOSAM 2024)
|
|
---|---|---|
Article Number | 02016 | |
Number of page(s) | 2 | |
Section | Topical Meeting (TOM) 2- Frontiers in Optical Metrology | |
DOI | https://doi.org/10.1051/epjconf/202430902016 | |
Published online | 31 October 2024 |
- J. Endres, N. Kumar, P. Petrik, M. Henn, S. Heidenreich, S.F. Pereira, H.P. Urbach, B. Bodermann, Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry, in: C. Gorecki, A.K. Asundi, W. Osten (Eds.), Brussels, Belgium, 2014: p. 913208. https://doi.org/10.1117/12.2052819. [Google Scholar]
- N. Kumar, P. Petrik, G.K.P. Ramanandan, O. El Gawhary, S. Roy, S.F. Pereira, W.M.J. Coene, H.P. Urbach, Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent Fourier scatterometry, Opt. Express 22 (2014) 24678. https://doi.org/10.1364/OE.22.024678. [Google Scholar]
- P. Petrik, N. Kumar, M. Fried, B. Fodor, G. Juhasz, S.F. Pereira, S. Burger, H.P. Urbach, Fourier ellipsometry - an ellipsometric approach to Fourier scatterometry, JEOS:RP 10 (2015) 15002. https://doi.org/10.2971/jeos.2015.15002. [Google Scholar]
- B. Bodermann, Z. Li, F. Pilarski, D. Bergmann, A 193nm microscope for CD metrology for the 32nm node and beyond, in: U.F.W. Behringer, W. Maurer (Eds.), Grenoble, France, 2010: p. 75450A. https://doi.org/10.1117/12.863627. [Google Scholar]
- P. Petrik, B. Fodor, E. Agocs, P. Kozma, J. Nador, N. Kumar, J. Endres, G. Juhasz, C. Major, S.F. Pereira, T. Lohner, H.P. Urbach, B. Bodermann, M. Fried, Methods for optical modeling and cross-checking in ellipsometry and scatterometry, in: B. Bodermann, K. Frenner, R.M. Silver (Eds.), Munich, Germany, 2015: p. 95260S. https://doi.org/10.1117/12.2184833. [Google Scholar]
- B. Bodermann, B. Loechel, F. Scholze, G. Dai, J. Wernecke, J. Endres, J. Probst, M. Schoengen, M. Krumrey, P.-E. Hansen, V. Soltwisch, Development of a scat- terometry reference standard, in: C. Gorecki, A.K. Asundi, W. Osten (Eds.), Brussels, Belgium, 2014: p. 91320A. https://doi.org/10.1117/12.2052278. [Google Scholar]
- B. Bodermann, E. Buhr, H.-U. Danzebrink, M. Bär, F. Scholze, M. Krumrey, M. Wurm, P. Klapetek, P.-E. Hansen, V. Korpelainen, M. van Veghel, A. Yacoot, S. Siitonen, O. El Gawhary, S. Burger, T. Saastamoinen, D.G. Seiler, A.C. Diebold, R. McDonald, A. Chabli, E.M. Secula, Joint Research on Scatterome- try and AFM Wafer Metrology, in: Grenoble (France), 2011: pp. 319-323. https://doi.org/10.1063/1.3657910. [Google Scholar]
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.