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Cited article:

Modelling of EUV light sources based on microwave discharge in inhomogeneous flow of nonequilibrium plasma with multiply charged tin and xenon ions

I.S. Abramov, E.D. Gospodchikov, A.G. Shalashov

EPJ Web Conf., 187 (2018) 01001

Published online: 2018-09-03

DOI: https://doi.org/10.1051/epjconf/201818701001

This article has been cited by the following article(s):

Innovative microwave discharge plasma technology for high-intensity extreme ultraviolet (EUV) radiation generation

H. Sadeghi, S. M. Sadat Kiai, S. Adlparvar and S. Fazelpour
Optical and Quantum Electronics 57 (7) (2025)
https://doi.org/10.1007/s11082-025-08312-y