EPJ Web Conf.
Volume 238, 2020EOS Annual Meeting (EOSAM 2020)
|Number of page(s)||2|
|Section||Topical Meeting (TOM) 6- Frontiers in Optical Metrology|
|Published online||20 August 2020|
Imaging Mueller matrix ellipsometry setup for optical nanoform metrology
1 Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany
2 Laboratory for Emerging Nanometrology, Technische Universität Braunschweig, Langer Kamp 6a/b, 38106 Braunschweig, Germany
* Corresponding author: firstname.lastname@example.org
Published online: 20 August 2020
We designed, realized, and characterised an imaging Mueller matrix ellipsometry setup for the pixelwise measurement of the Mueller matrices in microscope images. Our setup is capable of performing measurements in reflection as well as in transmission in a broad range of angles of incidence for wavelengths between 400 nm and 700 nm. We compared measurements of specially designed nanostructured samples with AFM and SEM measurements as well as with numerical simulations using the finite element method.
© The Authors, published by EDP Sciences, 2020
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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